Akademik Veri Yönetim Sistemi
JOURNAL OF MATERIALS SCIENCE: MATERIALS IN ELECTRONICS, cilt.36, sa.31, ss.1-12, 2025 (SCI-Expanded, Scopus)
Titanium (Ti) thin films are widely used in microelectronics, photovoltaics, and optoelectronics owing to their excellent electrical, mechanical, and interfacial properties. While deposition parameters have been extensively studied, the effect of substrate conductivity—particularly among glass-based substrates—remains insufficiently explored. In this work, Ti films were sputtered under identical conditions onto soda-lime glass, indium tin oxide (ITO), and fluorine-doped tin oxide (FTO) to isolate the role of substrate electrical and surface properties. X-Ray Diffraction (XRD) analysis revealed a strong (002) preferred orientation across all substrates, with narrower full width at half maximum (FWHM) values and larger grain sizes observed for conductive ITO and FTO compared to glass, indicating enhanced crystallinity of deposited Ti films. The Scanning Electron Microscopy (SEM) images reveal a two-dimensional hexagonal platelets crystalline surface feature. Additionally, the effect of substrate conductivity on growth behavior was examined in relation to surface characteristics. Moreover, optical measurements further supported improved transmittance for ITO- and FTO-based Ti films. The novelty of this work lies in isolating the effect of substrate conductivity under fixed process parameters, allowing a direct assessment of how electrical and surface properties influence Ti film growth. The findings contribute valuable insight for the targeted engineering of Ti interfaces in advanced thin-film technologies, where substrate–film interactions are critical to performance.