Development of anti-reflection coatings with high laser-induced damage thresholds for 1064 and 1535 nm laser wavelengths
Optical Engineering, cilt.65, sa.7, 2026 (SCI-Expanded, Scopus)
- Yayın Türü: Makale / Tam Makale
- Cilt numarası: 65 Sayı: 7
- Basım Tarihi: 2026
- Doi Numarası: 10.1117/1.oe.65.7.075101
- Dergi Adı: Optical Engineering
- Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Applied Science & Technology Source, Compendex, INSPEC, Academic Search Ultimate (EBSCO), Engineering Source (EBSCO)
- Anahtar Kelimeler: anti-reflection, laser, laser-induced damage threshold, physical vapor deposition, thin film
- Sivas Cumhuriyet Üniversitesi Adresli: Evet
Özet
We focus on the development and experimental evaluation of anti-reflection (AR) coatings with high laser-induced damage threshold (LIDT) designed independently for operation at 1064 and 1535 nm, which are critical wavelengths for high-power and eye-safe laser applications. Separate multilayer AR coating designs were developed using hafnium oxide (HfO2) as the high-refractive-index material and silicon dioxide (SiO2) as the low-refractive-index material. For each target wavelength, the optical design was optimized to achieve low reflectance at the specified wavelength. The coatings were deposited using a physical vapor deposition technique under controlled vacuum conditions. Optical performance was evaluated by spectrophotometric measurements, and the laser-induced damage threshold was determined using standardized testing procedures. The results show that HfO2/SiO2-based AR coatings designed for individual target wavelengths achieve low reflectance and exhibit resistance to laser-induced damage under the investigated conditions. The experimental results demonstrate the feasibility of achieving high-LIDT AR coatings using conventional deposition techniques.